Technical advantages：Microwave plasma cleaning has very outstanding advantages, such as high cleaning efficiency, no damage to the semiconductor components or secondary contamination, and the ability to thoroughly clean and treat contaminants on the material surface. It is especially suitable for sensitive chip package cleaning.
Product overview：
Full-Featured Design in Rack Style
Suitable for Batch Production
PLC Control System with GUI Touch Screen
Applications: Removal of organic containment, polymer activation, metal deoxidation, PR descum, polymerization coating.
Features:
Non-damage plasma clean
Effectively clean small holes and internal surface
Strong deoxidation ablity
Low process temperature
Options:
Vacuum pump
Additional gas inlets
Rotary worktable
Workholder with shelves
Microwave coupling top/side
Soft start and slow vent
Faraday cage
Pullout door or swing door
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